Tolerance and application of polarization independent waveguide for communication devices

Kerstin Worhoff, C.G.H. Roeloffzen, R.M. de Ridder, G. Sengo, L.T.H. Hilderink, Paul Lambeck, A. Driessen

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    36 Downloads (Pure)

    Abstract

    A polarization independent optical waveguide structure has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis was based on typical parameters of the silicon oxynitride technology. The optimized waveguide structure meets the criterion of a channel birefringence within 5x10-5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm. The optimized waveguide, fulfilling also the remaining demands of the application, has been applied for the realization of a passband flattened add-drop multiplexing device with 0.4 nm free spectral range and 0.03 nm TE-TM shift.
    Original languageEnglish
    Title of host publicationIEEE/LEOS Benelux Chapter 2004 Annual Symposium
    Place of PublicationUSA
    PublisherIEEE/LEOS Benelux Chapter
    Pages107-110
    Number of pages4
    ISBN (Print)978-9-07654-606-3
    Publication statusPublished - 3 Dec 2004
    Event9th Annual Symposium IEEE/LEOS Benelux Chapter 2004 - Ghent, Belgium
    Duration: 2 Dec 20043 Dec 2004
    Conference number: 9

    Conference

    Conference9th Annual Symposium IEEE/LEOS Benelux Chapter 2004
    CountryBelgium
    CityGhent
    Period2/12/043/12/04

      Fingerprint

    Keywords

    • EWI-15969
    • IR-58212
    • METIS-220642

    Cite this

    Worhoff, K., Roeloffzen, C. G. H., de Ridder, R. M., Sengo, G., Hilderink, L. T. H., Lambeck, P., & Driessen, A. (2004). Tolerance and application of polarization independent waveguide for communication devices. In IEEE/LEOS Benelux Chapter 2004 Annual Symposium (pp. 107-110). USA: IEEE/LEOS Benelux Chapter.