Tolerance and application of polarization independent waveguide for communication devices

Kerstin Worhoff; C.G.H. Roeloffzen; R.M. de Ridder; G. Sengo; L.T.H. Hilderink; Paul Lambeck; A. Driessen

Tolerance and application of polarization independent waveguide for communication devices

Kerstin Worhoff
, C.G.H. Roeloffzen
, R.M. de Ridder
, G. Sengo
, L.T.H. Hilderink
, Paul Lambeck
, A. Driessen

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

A polarization independent optical waveguide structure has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis was based on typical parameters of the silicon oxynitride technology. The optimized waveguide structure meets the criterion of a channel birefringence within 5x10-5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm. The optimized waveguide, fulfilling also the remaining demands of the application, has been applied for the realization of a passband flattened add-drop multiplexing device with 0.4 nm free spectral range and 0.03 nm TE-TM shift.

Original language	English
Title of host publication	IEEE/LEOS Benelux Chapter 2004 Annual Symposium
Place of Publication	USA
Publisher	IEEE
Pages	107-110
Number of pages	4
ISBN (Print)	978-9-07654-606-3
Publication status	Published - 3 Dec 2004
Event	9th Annual Symposium IEEE/LEOS Benelux Chapter 2004 - Ghent, Belgium Duration: 2 Dec 2004 → 3 Dec 2004 Conference number: 9

Conference

Conference	9th Annual Symposium IEEE/LEOS Benelux Chapter 2004
Country/Territory	Belgium
City	Ghent
Period	2/12/04 → 3/12/04

Keywords

EWI-15969
IR-58212
METIS-220642

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title = "Tolerance and application of polarization independent waveguide for communication devices",

abstract = "A polarization independent optical waveguide structure has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis was based on typical parameters of the silicon oxynitride technology. The optimized waveguide structure meets the criterion of a channel birefringence within 5x10-5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm. The optimized waveguide, fulfilling also the remaining demands of the application, has been applied for the realization of a passband flattened add-drop multiplexing device with 0.4 nm free spectral range and 0.03 nm TE-TM shift.",

keywords = "EWI-15969, IR-58212, METIS-220642",

author = "Kerstin Worhoff and C.G.H. Roeloffzen and \{de Ridder\}, R.M. and G. Sengo and L.T.H. Hilderink and Paul Lambeck and A. Driessen",

year = "2004",

month = dec,

day = "3",

language = "English",

isbn = "978-9-07654-606-3",

pages = "107--110",

booktitle = "IEEE/LEOS Benelux Chapter 2004 Annual Symposium",

publisher = "IEEE",

address = "United States",

note = "9th Annual Symposium IEEE/LEOS Benelux Chapter 2004 ; Conference date: 02-12-2004 Through 03-12-2004",

}

TY - GEN

T1 - Tolerance and application of polarization independent waveguide for communication devices

AU - Worhoff, Kerstin

AU - Roeloffzen, C.G.H.

AU - de Ridder, R.M.

AU - Sengo, G.

AU - Hilderink, L.T.H.

AU - Lambeck, Paul

AU - Driessen, A.

N1 - Conference code: 9

PY - 2004/12/3

Y1 - 2004/12/3

N2 - A polarization independent optical waveguide structure has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis was based on typical parameters of the silicon oxynitride technology. The optimized waveguide structure meets the criterion of a channel birefringence within 5x10-5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm. The optimized waveguide, fulfilling also the remaining demands of the application, has been applied for the realization of a passband flattened add-drop multiplexing device with 0.4 nm free spectral range and 0.03 nm TE-TM shift.

AB - A polarization independent optical waveguide structure has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis was based on typical parameters of the silicon oxynitride technology. The optimized waveguide structure meets the criterion of a channel birefringence within 5x10-5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm. The optimized waveguide, fulfilling also the remaining demands of the application, has been applied for the realization of a passband flattened add-drop multiplexing device with 0.4 nm free spectral range and 0.03 nm TE-TM shift.

KW - EWI-15969

KW - IR-58212

KW - METIS-220642

M3 - Conference contribution

SN - 978-9-07654-606-3

SP - 107

EP - 110

BT - IEEE/LEOS Benelux Chapter 2004 Annual Symposium

PB - IEEE

CY - USA

T2 - 9th Annual Symposium IEEE/LEOS Benelux Chapter 2004

Y2 - 2 December 2004 through 3 December 2004

ER -

Tolerance and application of polarization independent waveguide for communication devices

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Keywords

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