Tolerance of polarization independent waveguides for communication devices

Kerstin Worhoff, C.G.H. Roeloffzen, R.M. de Ridder, G. Sengo, L.T.H. Hilderink, A. Driessen

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    4 Citations (Scopus)

    Abstract

    A polarization independent optical waveguide structure suited for operation in the third communication window has been developed and optimized towards minimized dependence on deviations in the processing parameters and very low processing complexity. The tolerance analysis and optimization have been based on the thin film parameters of the widely applied silicon oxynitride technology. The silicon oxynitride layers have typically a material birefringence (nTMnTE) between 1-2 × 10 -3 and can be deposited within a uniformity and reproducibility of 1% in thickness (d), 5×10-4 in refractive index (n) and 100 nm in channel width (w). The optimized waveguide structure meets the criterion of a channel birefringence (Δneff,TM-TE) within 5×10 -5 taking the processing tolerance into account. Moreover, it was found that the channel birefringence is thickness independent (within the 10-5 criterion) over a range of up to 200 nm (δΔ eff,TM-TE / δd = 0). Furthermore, the optimized waveguide is fulfilling the remaining demands of the application aimed at, such as monomodality, low fiber to chip coupling loss (< 0.5 dB/facet) and low loss bends with a radius down to 600 nm. This waveguiding structure has been applied for the realization of a passband flattened add-drop multiplexing device (or interleaver) with 0.4 nm free spectral range and 0.03 nm TE-TM shift. Based on this shift, a polarization dependence of 3 × 10-5 was calculated for the optical waveguides.
    Original languageEnglish
    Title of host publicationIntegrated Optics and Photonic Integrated Circuits 2004
    Place of PublicationBellingham
    PublisherSPIE
    Pages369-380
    Number of pages12
    ISBN (Print)0-8194-5374-9
    DOIs
    Publication statusPublished - 27 Apr 2004
    EventSPIE Photonics Europe 2004 - Strasbourg, France
    Duration: 27 Apr 200429 Apr 2004

    Publication series

    NameProceedings of Spie
    PublisherSPIE
    NumberPaper 55
    Volume5451
    ISSN (Print)0277-786X

    Conference

    ConferenceSPIE Photonics Europe 2004
    CountryFrance
    CityStrasbourg
    Period27/04/0429/04/04

    Keywords

    • Adiabatic bend
    • Fiber-chip coupling
    • Silicon oxynitride
    • Optical add drop multiplexer
    • IR-75105
    • Tolerance analysis
    • Optical waveguide
    • EWI-15970
    • METIS-220637
    • Polarization independent waveguide

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