Towards a business-IT aligned maturity model for collaborative networked organizations

Roberto Santana Tapia, Maya Daneva, Pascal van Eck, Roel Wieringa

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    Aligning business and IT in networked organizations is a complex endeavor because in such settings, business-IT alignment is driven by economic processes instead of by centralized decision-making processes. In order to facilitate managing business-IT alignment in networked organizations, we need a maturity model that allows collaborating organizations to assess the current state of alignment and take appropriate action to improve it where needed. In this paper we propose the first version of such a model, which we derive from various alignment models and theories.
    Original languageEnglish
    Title of host publication12th Enterprise Distributed Object Computing Conference Workshops, 2008
    Place of PublicationPiscataway, NJ
    PublisherIEEE
    Pages276-287
    Number of pages12
    ISBN (Print)978-0-7695-3720-7
    DOIs
    Publication statusPublished - Sep 2008
    EventInternational Workshop on Enterprise Interoperability, IWEI 2008 - Munich, Germany
    Duration: 18 Sep 200818 Sep 2008

    Publication series

    NameEnterprise Distributed Object Computing Conference Workshops
    PublisherIEEE
    Volume2008
    ISSN (Print)2325-6583
    ISSN (Electronic)2325-6605

    Conference

    ConferenceInternational Workshop on Enterprise Interoperability, IWEI 2008
    Abbreviated titleIWEI
    CountryGermany
    CityMunich
    Period18/09/0818/09/08

    Keywords

    • SCS-Services

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  • Cite this

    Santana Tapia, R., Daneva, M., van Eck, P., & Wieringa, R. (2008). Towards a business-IT aligned maturity model for collaborative networked organizations. In 12th Enterprise Distributed Object Computing Conference Workshops, 2008 (pp. 276-287). (Enterprise Distributed Object Computing Conference Workshops; Vol. 2008). Piscataway, NJ: IEEE. https://doi.org/10.1109/EDOCW.2008.59