Skip to main navigation Skip to search Skip to main content

Transient rapid thermal annealing (T-RTA) for low-dose high-energy phosphorus implants

  • J.L.P. Heideman
  • , I. Barsony
  • , J. Middelhoek
  • , Hans Wallinga

    Research output: Contribution to conferencePosterOther research output

    Original languageEnglish
    Pages-
    Publication statusPublished - 29 Nov 1990
    EventFOM Werkgemeenschap Halfgeleiders 1990 - Veldhoven, Netherlands
    Duration: 28 Nov 199029 Nov 1990

    Conference

    ConferenceFOM Werkgemeenschap Halfgeleiders 1990
    Country/TerritoryNetherlands
    CityVeldhoven
    Period28/11/9029/11/90

    Keywords

    • METIS-117182

    Cite this