TRENDY: An integrated program for IC process and device simulation

E. van Schie

    Research output: ThesisPhD Thesis - Research UT, graduation UT

    Original languageUndefined
    Awarding Institution
    • University of Twente
    Supervisors/Advisors
    • Middelhoek, J., Supervisor
    • Wallinga, Hans, Supervisor
    • Mouthaan, A.J., Advisor
    Award date12 Apr 1990
    Place of PublicationEnschede
    Print ISBNs90-9003357-2
    Publication statusPublished - 12 Apr 1990

    Keywords

    • METIS-111427

    Cite this

    @phdthesis{ca0fab10d879404bb92db68bc20e68b8,
    title = "TRENDY: An integrated program for IC process and device simulation",
    keywords = "METIS-111427",
    author = "{van Schie}, E.",
    year = "1990",
    month = "4",
    day = "12",
    language = "Undefined",
    isbn = "90-9003357-2",
    school = "University of Twente",

    }

    van Schie, E 1990, 'TRENDY: An integrated program for IC process and device simulation', University of Twente, Enschede.

    TRENDY: An integrated program for IC process and device simulation. / van Schie, E.

    Enschede, 1990. 221 p.

    Research output: ThesisPhD Thesis - Research UT, graduation UT

    TY - THES

    T1 - TRENDY: An integrated program for IC process and device simulation

    AU - van Schie, E.

    PY - 1990/4/12

    Y1 - 1990/4/12

    KW - METIS-111427

    M3 - PhD Thesis - Research UT, graduation UT

    SN - 90-9003357-2

    CY - Enschede

    ER -