TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR

Arne Leinse; Rene Heideman; Willem Beeker; W.P. Beeker; M. Hoekman; C.M. Bruinink; C.G.H. Roeloffzen; L. Zhuang; D.A.I. Marpaung; M. Burla

TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR

Arne Leinse, Rene Heideman, Willem Beeker, W.P. Beeker, M. Hoekman, C.M. Bruinink, C.G.H. Roeloffzen, L. Zhuang, D.A.I. Marpaung, M. Burla

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

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Abstract

The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleXTM waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleXTM technology

Original language	Undefined
Title of host publication	16th European Conference on Integrated Optics, ECIO 2012
Place of Publication	Barcelona, Spain
Publisher	Institut de Ciencies Fotoniques
Pages	1-2
Number of pages	2
ISBN (Print)	not assigned
Publication status	Published - 19 Apr 2012
Event	16th European Conference on Integrated Optics, ECIO 2012 - Sitges-Barcelona, Spain Duration: 18 Apr 2012 → 20 Apr 2012 Conference number: 16

Publication series

Name
Publisher	Institut de Ciències Fotòniques

Conference

Conference	16th European Conference on Integrated Optics, ECIO 2012
Abbreviated title	ECIO
Country/Territory	Spain
City	Sitges-Barcelona
Period	18/04/12 → 20/04/12

Keywords

METIS-296059
EWI-21808
IR-80288

Access to Document

http://eprints.eemcs.utwente.nl/secure2/21808/01/Leinse_ECIO_2012.pdf

Cite this

Leinse, A., Heideman, R., Beeker, W., Beeker, W. P., Hoekman, M., Bruinink, C. M., Roeloffzen, C. G. H., Zhuang, L., Marpaung, D. A. I., & Burla, M. (2012). TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR. In 16th European Conference on Integrated Optics, ECIO 2012 (pp. 1-2). Institut de Ciencies Fotoniques. http://eprints.eemcs.utwente.nl/secure2/21808/01/Leinse_ECIO_2012.pdf

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abstract = "The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleXTM waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleXTM technology",

keywords = "METIS-296059, EWI-21808, IR-80288",

author = "Arne Leinse and Rene Heideman and Willem Beeker and W.P. Beeker and M. Hoekman and C.M. Bruinink and C.G.H. Roeloffzen and L. Zhuang and D.A.I. Marpaung and M. Burla",

year = "2012",

month = apr,

day = "19",

language = "Undefined",

isbn = "not assigned",

publisher = "Institut de Ciencies Fotoniques",

pages = "1--2",

booktitle = "16th European Conference on Integrated Optics, ECIO 2012",

note = "16th European Conference on Integrated Optics, ECIO 2012 ; Conference date: 18-04-2012 Through 20-04-2012",

}

Leinse, A, Heideman, R, Beeker, W, Beeker, WP, Hoekman, M, Bruinink, CM, Roeloffzen, CGH, Zhuang, L, Marpaung, DAI & Burla, M 2012, TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR. in 16th European Conference on Integrated Optics, ECIO 2012. Institut de Ciencies Fotoniques, Barcelona, Spain, pp. 1-2, 16th European Conference on Integrated Optics, ECIO 2012, Sitges-Barcelona, Spain, 18/04/12. <http://eprints.eemcs.utwente.nl/secure2/21808/01/Leinse_ECIO_2012.pdf>

TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR. / Leinse, Arne; Heideman, Rene; Beeker, Willem et al.
16th European Conference on Integrated Optics, ECIO 2012. Barcelona, Spain: Institut de Ciencies Fotoniques, 2012. p. 1-2.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

TY - GEN

T1 - TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR

AU - Leinse, Arne

AU - Heideman, Rene

AU - Beeker, Willem

AU - Beeker, W.P.

AU - Hoekman, M.

AU - Bruinink, C.M.

AU - Roeloffzen, C.G.H.

AU - Zhuang, L.

AU - Marpaung, D.A.I.

AU - Burla, M.

N1 - Conference code: 16

PY - 2012/4/19

Y1 - 2012/4/19

N2 - The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleXTM waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleXTM technology

AB - The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleXTM waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleXTM technology

KW - METIS-296059

KW - EWI-21808

KW - IR-80288

M3 - Conference contribution

SN - not assigned

SP - 1

EP - 2

BT - 16th European Conference on Integrated Optics, ECIO 2012

PB - Institut de Ciencies Fotoniques

CY - Barcelona, Spain

T2 - 16th European Conference on Integrated Optics, ECIO 2012

Y2 - 18 April 2012 through 20 April 2012

ER -