TriPlextm photonic platform technology: Low-loss waveguide platform for applications from UV to IR

Arne Leinse, Rene Heideman, Willem Beeker, W.P. Beeker, M. Hoekman, C.M. Bruinink, C.G.H. Roeloffzen, L. Zhuang, D.A.I. Marpaung, M. Burla

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

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    The CMOS compatible fabrication equipment, the transparency from UV to IR and the capability of batch processing make the TriPleXTM waveguide platform very suitable for a large variety of applications. In this paper a description of the technology and examples of applications in different wavelength ranges are given. These applications exploit the low loss properties at relatively high index contrasts in the TriPleXTM technology
    Original languageUndefined
    Title of host publication16th European Conference on Integrated Optics, ECIO 2012
    Place of PublicationBarcelona, Spain
    PublisherInstitut de Ciencies Fotoniques
    Number of pages2
    ISBN (Print)not assigned
    Publication statusPublished - 19 Apr 2012
    Event16th European Conference on Integrated Optics, ECIO 2012 - Sitges-Barcelona, Spain
    Duration: 18 Apr 201220 Apr 2012
    Conference number: 16

    Publication series

    PublisherInstitut de Ciències Fotòniques


    Conference16th European Conference on Integrated Optics, ECIO 2012
    Abbreviated titleECIO


    • METIS-296059
    • EWI-21808
    • IR-80288

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