Two Dimensional Simulation of Mechanical Stress Evolution and Electromigration in Confined Aluminum Interconnects

V. Petrescu, A.J. Mouthaan

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of the Stress Induced Phenomena in Metallization
    Place of PublicationJapan
    Pages329-334
    Number of pages7
    Publication statusPublished - 1 Jun 1998

    Keywords

    • METIS-113843

    Cite this

    Petrescu, V., & Mouthaan, A. J. (1998). Two Dimensional Simulation of Mechanical Stress Evolution and Electromigration in Confined Aluminum Interconnects. In Proceedings of the Stress Induced Phenomena in Metallization (pp. 329-334). Japan.