Ultra-shallow dopant diffusion from pre-deposited RPCVD monolayers ofarsenic and phosphorus

Miloš Popadić*, Lis K. Nanver, T. L.M. Scholtes

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

6 Citations (Scopus)

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