Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers

R.A. Loch; R. Sobierajski; C. Bostedt; J. Bozek; T. Burian; J. Chalupsky; J. Gaudin; A. Graf; J. Grzonka; V. Hajkova; S. Hau-Riege; E.D. van Hattum; L. Juha; D. Kllinger; J. Krzywinski; R.A. London; Eric Louis; M. Messerschmidt; S. Moeller; T. Plocinski; A. Wawro; P. Zabierowski; Frederik Bijkerk

Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers

R.A. Loch, R. Sobierajski, C. Bostedt, J. Bozek, T. Burian, J. Chalupsky, J. Gaudin, A. Graf, J. Grzonka, V. Hajkova, S. Hau-Riege, E.D. van Hattum, L. Juha, D. Kllinger, J. Krzywinski, R.A. London, Eric Louis, M. Messerschmidt, S. Moeller, T. PlocinskiA. Wawro, P. Zabierowski, Frederik Bijkerk

Laser Physics & Nonlinear Optics

Research output: Contribution to conference › Poster › Other research output

Abstract

Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optical surface is a possible limitation. Therefore, resistivity studies of MoSi multilayers for different wavelengths were carried out at FLASH and LCLS. The results show that the leading damage mechanism is melting of the amorphous silicon layers, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent and is related to the absorbed energy density.

Original language	English
Pages	-
Publication status	Published - 16 Jan 2012
Event	Physics@FOM Veldhoven 2012: Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing - NH Koningshof Veldhoven, Veldhoven, Netherlands Duration: 17 Jan 2012 → 18 Jan 2012

Conference

Conference	Physics@FOM Veldhoven 2012
Country/Territory	Netherlands
City	Veldhoven
Period	17/01/12 → 18/01/12

Keywords

METIS-294426

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Loch, R. A., Sobierajski, R., Bostedt, C., Bozek, J., Burian, T., Chalupsky, J., Gaudin, J., Graf, A., Grzonka, J., Hajkova, V., Hau-Riege, S., van Hattum, E. D., Juha, L., Kllinger, D., Krzywinski, J., London, R. A., Louis, E., Messerschmidt, M., Moeller, S., ... Bijkerk, F. (2012). Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers. -. Poster session presented at Physics@FOM Veldhoven 2012, Veldhoven, Netherlands.

@conference{fc97c71a079f4990ba5be55c287e54bb,

title = "Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers",

abstract = "Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optical surface is a possible limitation. Therefore, resistivity studies of MoSi multilayers for different wavelengths were carried out at FLASH and LCLS. The results show that the leading damage mechanism is melting of the amorphous silicon layers, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent and is related to the absorbed energy density.",

keywords = "METIS-294426",

author = "R.A. Loch and R. Sobierajski and C. Bostedt and J. Bozek and T. Burian and J. Chalupsky and J. Gaudin and A. Graf and J. Grzonka and V. Hajkova and S. Hau-Riege and {van Hattum}, E.D. and L. Juha and D. Kllinger and J. Krzywinski and R.A. London and Eric Louis and M. Messerschmidt and S. Moeller and T. Plocinski and A. Wawro and P. Zabierowski and Frederik Bijkerk",

year = "2012",

month = jan,

day = "16",

language = "English",

pages = "--",

note = "Physics@FOM Veldhoven 2012 : Tertiary Chemical interactions at the interfaces of Mo/B4C/Si/B4C multilayers upon low-temperature annealing ; Conference date: 17-01-2012 Through 18-01-2012",

}

Loch, RA, Sobierajski, R, Bostedt, C, Bozek, J, Burian, T, Chalupsky, J, Gaudin, J, Graf, A, Grzonka, J, Hajkova, V, Hau-Riege, S, van Hattum, ED, Juha, L, Kllinger, D, Krzywinski, J, London, RA, Louis, E, Messerschmidt, M, Moeller, S, Plocinski, T, Wawro, A, Zabierowski, P & Bijkerk, F 2012, 'Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers', Physics@FOM Veldhoven 2012, Veldhoven, Netherlands, 17/01/12 - 18/01/12 pp. -.

TY - CONF

T1 - Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers

AU - Loch, R.A.

AU - Sobierajski, R.

AU - Bostedt, C.

AU - Bozek, J.

AU - Burian, T.

AU - Chalupsky, J.

AU - Gaudin, J.

AU - Graf, A.

AU - Grzonka, J.

AU - Hajkova, V.

AU - Hau-Riege, S.

AU - van Hattum, E.D.

AU - Juha, L.

AU - Kllinger, D.

AU - Krzywinski, J.

AU - London, R.A.

AU - Louis, Eric

AU - Messerschmidt, M.

AU - Moeller, S.

AU - Plocinski, T.

AU - Wawro, A.

AU - Zabierowski, P.

AU - Bijkerk, Frederik

PY - 2012/1/16

Y1 - 2012/1/16

N2 - Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optical surface is a possible limitation. Therefore, resistivity studies of MoSi multilayers for different wavelengths were carried out at FLASH and LCLS. The results show that the leading damage mechanism is melting of the amorphous silicon layers, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent and is related to the absorbed energy density.

AB - Multilayer coated optics are promising candidates for optical schemes at XUV & X-ray Free Electron Lasers (FELs), including the (possible) new ZFEL in The Netherlands. However, due to the extremely high photon flux of these FELs, damage of any optical surface is a possible limitation. Therefore, resistivity studies of MoSi multilayers for different wavelengths were carried out at FLASH and LCLS. The results show that the leading damage mechanism is melting of the amorphous silicon layers, followed by Mo atoms diffusion into Si, leading to molybdenum-silicide formation. Although a similar final state of damage was observed, the damage threshold appeared to be strongly wavelength dependent and is related to the absorbed energy density.

KW - METIS-294426

M3 - Poster

SP - -

T2 - Physics@FOM Veldhoven 2012

Y2 - 17 January 2012 through 18 January 2012

ER -

Ultrafast thermal damage mechanisms in Mo/Si based multilayers for short-wavelength Free Electron Lasers

Abstract

Conference

Keywords

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