Ultralow-k dielectrics made by supercritical foaming of thin polymer films

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Keywords

@article{3fc0831f39bc419aa1625d8ee423eb82,

title = "Ultralow-k dielectrics made by supercritical foaming of thin polymer films",

keywords = "IR-38178, METIS-209144",

author = "B. Krause and G.H. Koops and \{van der Vegt\}, N.F.A. and Matthias Wessling and Michel Wubbenhorst and \{van Turnhout\}, Jan",

year = "2002",

doi = "10.1002/1521-4095(20020805)14:15<1041::AID-ADMA1041>3.0.CO;2-A",

language = "Undefined",

volume = "14",

pages = "1041--1046",

journal = "Advanced materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "15",

}

TY - JOUR

T1 - Ultralow-k dielectrics made by supercritical foaming of thin polymer films

AU - Krause, B.

AU - Koops, G.H.

AU - van der Vegt, N.F.A.

AU - Wessling, Matthias

AU - Wubbenhorst, Michel

AU - van Turnhout, Jan

PY - 2002

Y1 - 2002

KW - IR-38178

KW - METIS-209144

U2 - 10.1002/1521-4095(20020805)14:15<1041::AID-ADMA1041>3.0.CO;2-A

DO - 10.1002/1521-4095(20020805)14:15<1041::AID-ADMA1041>3.0.CO;2-A

M3 - Article

SN - 0935-9648

VL - 14

SP - 1041

EP - 1046

JO - Advanced materials

JF - Advanced materials

IS - 15

ER -