Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

M. Huijben*, P. Yu, L.W. Martin, H.J.A. Molegraaf, Y.H. Chu, M.B. Holcomb, N. Balke, G. Rijnders, R. Ramesh

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

58 Citations (Scopus)
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Abstract

Exchange bias coupling at the multiferroic- ferromagnetic interface in BiFeO3/La0.7Sr0.3MnO3 heterostructures exhibits a critical thickness for ultrathin BiFeO3 layers of 5 unit cells (2 nm). Linear dichroism measurements demonstrate the dependence on the BiFeO3 layer thickness with a strong reduction for ultrathin layers, indicating diminished antiferromagnetic ordering that prevents interfacial exchange bias coupling.

Original languageEnglish
Pages (from-to)4739-4745
Number of pages7
JournalAdvanced materials
Volume25
Issue number34
DOIs
Publication statusPublished - 14 Sept 2013

Keywords

  • Exchange bias
  • Ferromagnet
  • Interface
  • Multiferroic
  • Oxide heterostructures
  • 2024 OA procedure

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