Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

M. Huijben; P. Yu; L.W. Martin; H.J.A. Molegraaf; Y.H. Chu; M.B. Holcomb; N. Balke; G. Rijnders; R. Ramesh

doi:10.1002/adma.201300940

Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

M. Huijben^*, P. Yu, L.W. Martin, H.J.A. Molegraaf, Y.H. Chu, M.B. Holcomb, N. Balke, G. Rijnders, R. Ramesh

^*Corresponding author for this work

Inorganic Materials Science

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Exchange bias coupling at the multiferroic- ferromagnetic interface in BiFeO₃/La_0.7Sr_0.3MnO₃ heterostructures exhibits a critical thickness for ultrathin BiFeO₃ layers of 5 unit cells (2 nm). Linear dichroism measurements demonstrate the dependence on the BiFeO₃ layer thickness with a strong reduction for ultrathin layers, indicating diminished antiferromagnetic ordering that prevents interfacial exchange bias coupling.

Original language	English
Pages (from-to)	4739-4745
Number of pages	7
Journal	Advanced materials
Volume	25
Issue number	34
DOIs	https://doi.org/10.1002/adma.201300940
Publication status	Published - 14 Sept 2013

Keywords

Exchange bias
Ferromagnet
Interface
Multiferroic
Oxide heterostructures
2024 OA procedure

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10.1002/adma.201300940

ArticleFinal published version, 4.04 MBLicence: Taverne

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@article{2916425ec94f470d9ab8bca0e7fade30,

title = "Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces",

abstract = "Exchange bias coupling at the multiferroic- ferromagnetic interface in BiFeO3/La0.7Sr0.3MnO3 heterostructures exhibits a critical thickness for ultrathin BiFeO3 layers of 5 unit cells (2 nm). Linear dichroism measurements demonstrate the dependence on the BiFeO3 layer thickness with a strong reduction for ultrathin layers, indicating diminished antiferromagnetic ordering that prevents interfacial exchange bias coupling.",

keywords = "Exchange bias, Ferromagnet, Interface, Multiferroic, Oxide heterostructures, 2024 OA procedure",

author = "M. Huijben and P. Yu and L.W. Martin and H.J.A. Molegraaf and Y.H. Chu and M.B. Holcomb and N. Balke and G. Rijnders and R. Ramesh",

year = "2013",

month = sep,

day = "14",

doi = "10.1002/adma.201300940",

language = "English",

volume = "25",

pages = "4739--4745",

journal = "Advanced materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "34",

}

TY - JOUR

T1 - Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

AU - Huijben, M.

AU - Yu, P.

AU - Martin, L.W.

AU - Molegraaf, H.J.A.

AU - Chu, Y.H.

AU - Holcomb, M.B.

AU - Balke, N.

AU - Rijnders, G.

AU - Ramesh, R.

PY - 2013/9/14

Y1 - 2013/9/14

N2 - Exchange bias coupling at the multiferroic- ferromagnetic interface in BiFeO3/La0.7Sr0.3MnO3 heterostructures exhibits a critical thickness for ultrathin BiFeO3 layers of 5 unit cells (2 nm). Linear dichroism measurements demonstrate the dependence on the BiFeO3 layer thickness with a strong reduction for ultrathin layers, indicating diminished antiferromagnetic ordering that prevents interfacial exchange bias coupling.

AB - Exchange bias coupling at the multiferroic- ferromagnetic interface in BiFeO3/La0.7Sr0.3MnO3 heterostructures exhibits a critical thickness for ultrathin BiFeO3 layers of 5 unit cells (2 nm). Linear dichroism measurements demonstrate the dependence on the BiFeO3 layer thickness with a strong reduction for ultrathin layers, indicating diminished antiferromagnetic ordering that prevents interfacial exchange bias coupling.

KW - Exchange bias

KW - Ferromagnet

KW - Interface

KW - Multiferroic

KW - Oxide heterostructures

KW - 2024 OA procedure

UR - http://www.scopus.com/inward/record.url?scp=84883774085&partnerID=8YFLogxK

U2 - 10.1002/adma.201300940

DO - 10.1002/adma.201300940

M3 - Article

SN - 0935-9648

VL - 25

SP - 4739

EP - 4745

JO - Advanced materials

JF - Advanced materials

IS - 34

ER -

Ultrathin Limit of Exchange Bias Coupling at Oxide Multiferroic/Ferromagnetic Interfaces

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Keywords

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