Understanding solid state diffusion in multilayered structures on a picometer lengthscale

Robbert Wilhelmus Elisabeth van de Kruijs, S. Bruijn, V.I.T.A. de Rooij-Lohmann

Research output: Other contributionOther research output

Abstract

Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.
Original languageEnglish
Place of PublicationVeldhoven, Netherlands
Publication statusPublished - 2011

Keywords

  • METIS-304969

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    van de Kruijs, R. W. E., Bruijn, S., & de Rooij-Lohmann, V. I. T. A. (2011). Understanding solid state diffusion in multilayered structures on a picometer lengthscale. Veldhoven, Netherlands.