TY - GEN
T1 - Understanding solid state diffusion in multilayered structures on a picometer lengthscale
AU - van de Kruijs, Robbert Wilhelmus Elisabeth
AU - Bruijn, S.
AU - de Rooij-Lohmann, V.I.T.A.
PY - 2011
Y1 - 2011
N2 - Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.
AB - Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.
KW - METIS-304969
M3 - Other contribution
CY - Veldhoven, Netherlands
ER -