Understanding solid state diffusion in multilayered structures on a picometer lengthscale

Robbert Wilhelmus Elisabeth van de Kruijs, S. Bruijn, V.I.T.A. de Rooij-Lohmann

Research output: Other contributionOther research output

Abstract

Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.
Original languageEnglish
Place of PublicationVeldhoven, Netherlands
Publication statusPublished - 2011

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solid state
x ray diffraction
mirrors
activation energy
annealing
thin films
temperature

Keywords

  • METIS-304969

Cite this

van de Kruijs, R. W. E., Bruijn, S., & de Rooij-Lohmann, V. I. T. A. (2011). Understanding solid state diffusion in multilayered structures on a picometer lengthscale. Veldhoven, Netherlands.
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abstract = "Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.",
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Understanding solid state diffusion in multilayered structures on a picometer lengthscale. / van de Kruijs, Robbert Wilhelmus Elisabeth; Bruijn, S.; de Rooij-Lohmann, V.I.T.A.

Veldhoven, Netherlands. 2011, .

Research output: Other contributionOther research output

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T1 - Understanding solid state diffusion in multilayered structures on a picometer lengthscale

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

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AU - de Rooij-Lohmann, V.I.T.A.

PY - 2011

Y1 - 2011

N2 - Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.

AB - Multilayered Extreme UV mirrors present unprecedented fundamental questions to solid state diffusion, requiring understanding of diffusion phenomena on lengthscales of only picometers. Using x-ray diffraction applied in situ during thermal annealing, we have investigated diffusion processes well below the Tammann temperature. Resolving picometer structural changes in Mo/Si multilayers reveals diffusion limited compound interface growth, exhibiting Arrhenius-like diffusion behaviour with a reduced activation energy connected to diffusion in the nano-crystalline layers and interfaces. These results are relevant for controlling diffusion processes on a picometer length scale, with potential spin-off to many other thin film applications.

KW - METIS-304969

M3 - Other contribution

CY - Veldhoven, Netherlands

ER -