Understanding the wear mechanism of FKM seals in load lock gate valve

Sandesh Itani*, Jamal Seyyed Monfared Zanjani* (Contributor), Pilar Bernal-Ortega* (Contributor), Wisut Kaewsakul* (Contributor), Anke Blume* (Contributor), M.B. de Rooij* (Contributor)

*Corresponding author for this work

Research output: Contribution to conferencePosterAcademic

5 Downloads (Pure)
Original languageEnglish
Number of pages1
Publication statusPublished - 10 Sept 2024
Event15th Fall Rubber Colloquium: KHK - H4 Hotel Hannover Messe Würzburger Straße 21 30880 Laatzen, Hannover, Germany
Duration: 10 Sept 202412 Sept 2024
https://www.dikautschuk.de/khk/program/scientific-program/

Conference

Conference15th Fall Rubber Colloquium: KHK
Country/TerritoryGermany
CityHannover
Period10/09/2412/09/24
Internet address

Keywords

  • Photolithography
  • fluororubber
  • microchips
  • Wear Particles

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