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Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2
Alfredo Mameli, Kanda Tapily, Jie Shen*, Fred Roozeboom, Mengcheng Lu, David O’Meara, Scott P. Semproni, Jiun Ruey Chen, Robert Clark, Gert Leusink, Scott Clendenning
*Corresponding author for this work
Research output: Contribution to journal › Article › Academic › peer-review
5
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(Scopus)