UV spectral filtering by surface structures multilayer mirrors

Qiushi Huang, D.M. Paardekooper, E. Zoethout, Viacheslav Medvedev, Robbert W.E. van de Kruijs, J. Bosgra, Eric Louis, Frederik Bijkerk

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Abstract

A surface structured extreme ultraviolet multilayer mirror was developed showing full band suppression of UV (𝜆=100–400  nm) and simultaneously a high reflectance of EUV light (𝜆=13.5  nm). The surface structure consists of Si pyramids, which are substantially transparent for EUV but reflective for UV light. The reflected UV is filtered out by blazed diffraction, interference, and absorption. A first demonstration pyramid structure was fabricated on a multilayer by using a straightforward deposition technique. It shows an average suppression of 14 times over the whole UV range and an EUV reflectance of 56.2% at 13.5 nm. This robust scheme can be used as a spectral purity solution for all XUV sources that emit longer wavelength radiation as well.
Original languageEnglish
Pages (from-to)1185-1188
Number of pages4
JournalOptics letters
Volume39
Issue number5
DOIs
Publication statusPublished - 2014

Keywords

  • METIS-302949
  • IR-89838

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