Abstract
A surface structured extreme ultraviolet multilayer mirror was developed showing full band suppression of UV (𝜆=100–400 nm) and simultaneously a high reflectance of EUV light (𝜆=13.5 nm). The surface structure consists of Si pyramids, which are substantially transparent for EUV but reflective for UV light. The reflected UV is filtered out by blazed diffraction, interference, and absorption. A first demonstration pyramid structure was fabricated on a multilayer by using a straightforward deposition technique. It shows an average suppression of 14 times over the whole UV range and an EUV reflectance of 56.2% at 13.5 nm. This robust scheme can be used as a spectral purity solution for all XUV sources that emit longer wavelength radiation as well.
Original language | English |
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Pages (from-to) | 1185-1188 |
Number of pages | 4 |
Journal | Optics letters |
Volume | 39 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2014 |
Keywords
- METIS-302949
- IR-89838