Abstract
The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.
| Original language | English |
|---|---|
| Pages (from-to) | 1956-1961 |
| Number of pages | 6 |
| Journal | Surface science |
| Volume | 605 |
| Issue number | 23-24 |
| DOIs | |
| Publication status | Published - 2011 |
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Keywords
- Cobalt
- Morphology
- Diffusion
- Roughness and topography
- IR-80437
- Scanning tunneling microscopy (STM)
- Surface structure
- METIS-280364
- Copper
Cite this
van Gastel, R., van Moere, R., Zandvliet, H. J. W., & Poelsema, B. (2011). Vacancy-mediated diffusion of Co atoms embedded in Cu(001). Surface science, 605(23-24), 1956-1961. https://doi.org/10.1016/j.sucs.2011.07.011, https://doi.org/10.1016/j.susc.2011.07.011