Vacancy-mediated diffusion of Co atoms embedded in Cu(001)

Raoul van Gastel, R. van Moere, Henricus J.W. Zandvliet, Bene Poelsema

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.
Original languageEnglish
Pages (from-to)1956-1961
Number of pages6
JournalSurface science
Volume605
Issue number23-24
DOIs
Publication statusPublished - 2011

Fingerprint

atoms
scanning tunneling microscopy
energy of formation
intervals
impurities
interactions
energy

Keywords

  • Cobalt
  • Morphology
  • Diffusion
  • Roughness and topography
  • IR-80437
  • Scanning tunneling microscopy (STM)
  • Surface structure
  • METIS-280364
  • Copper

Cite this

van Gastel, Raoul ; van Moere, R. ; Zandvliet, Henricus J.W. ; Poelsema, Bene. / Vacancy-mediated diffusion of Co atoms embedded in Cu(001). In: Surface science. 2011 ; Vol. 605, No. 23-24. pp. 1956-1961.
@article{6063a41e9a364168a0e82af0f22fc108,
title = "Vacancy-mediated diffusion of Co atoms embedded in Cu(001)",
abstract = "The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.",
keywords = "Cobalt, Morphology, Diffusion, Roughness and topography, IR-80437, Scanning tunneling microscopy (STM), Surface structure, METIS-280364, Copper",
author = "{van Gastel}, Raoul and {van Moere}, R. and Zandvliet, {Henricus J.W.} and Bene Poelsema",
year = "2011",
doi = "10.1016/j.sucs.2011.07.011",
language = "English",
volume = "605",
pages = "1956--1961",
journal = "Surface science",
issn = "0039-6028",
publisher = "Elsevier",
number = "23-24",

}

Vacancy-mediated diffusion of Co atoms embedded in Cu(001). / van Gastel, Raoul; van Moere, R.; Zandvliet, Henricus J.W.; Poelsema, Bene.

In: Surface science, Vol. 605, No. 23-24, 2011, p. 1956-1961.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Vacancy-mediated diffusion of Co atoms embedded in Cu(001)

AU - van Gastel, Raoul

AU - van Moere, R.

AU - Zandvliet, Henricus J.W.

AU - Poelsema, Bene

PY - 2011

Y1 - 2011

N2 - The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.

AB - The diffusion of Co atoms in the Cu(001) surface has been studied using Scanning Tunneling Microscopy (STM). Like other impurities in the Cu(001) surface, the diffusion of Co is mediated by single surface vacancies. STM images reveal that diffusion of the embedded atoms takes place through multi-atom jumps separated by long time intervals, which is characteristic for this type of diffusion. The jump length and frequency are measured to establish the nature of the interaction between surface vacancies and the embedded Co atoms and to extract the relevant formation and diffusion energies.

KW - Cobalt

KW - Morphology

KW - Diffusion

KW - Roughness and topography

KW - IR-80437

KW - Scanning tunneling microscopy (STM)

KW - Surface structure

KW - METIS-280364

KW - Copper

U2 - 10.1016/j.sucs.2011.07.011

DO - 10.1016/j.sucs.2011.07.011

M3 - Article

VL - 605

SP - 1956

EP - 1961

JO - Surface science

JF - Surface science

SN - 0039-6028

IS - 23-24

ER -