Validating foundry technologies for extended mission profiles

K. Dijk, P. Volf, C. Detcheverry, A. Yau, P. Ngan, Z. Liang, F.G. Kuper

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    4 Citations (Scopus)
    18 Downloads (Pure)

    Abstract

    This paper presents a process qualification and characterization strategy that can extend the foundry process reliability potential to meet specific automotive mission profile requirements. In this case study, data and analyses are provided that lead to sufficient confidence for pushing the allowed mission profile envelope of a process towards more aggressive (automotive) applications.
    Original languageEnglish
    Title of host publication2010 IEEE International Reliability Physics Symposium, IRPS 2010
    Subtitle of host publicationAnaheim, California, USA, 2 - 6 May 2010
    Place of PublicationPiscataway, NJ
    PublisherIEEE Computer Society
    Pages111-116
    Number of pages6
    ISBN (Print)978-1-4244-5430-3, 978-1-4244-5431-0
    DOIs
    Publication statusPublished - 2 May 2010
    Event48th Annual IEEE International Reliability Physics Symposium, IRPS 2010 - Hyatt Regency Orange County Garden Grove, Anaheim, United States
    Duration: 2 May 20106 May 2010
    Conference number: 48

    Conference

    Conference48th Annual IEEE International Reliability Physics Symposium, IRPS 2010
    Abbreviated titleIRPS
    CountryUnited States
    CityAnaheim
    Period2/05/106/05/10

    Keywords

    • METIS-270932
    • IR-72455
    • SRAM Vddmin
    • HTOL
    • qualification strategy
    • guard band
    • test screens
    • EWI-18190
    • ppm level

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  • Cite this

    Dijk, K., Volf, P., Detcheverry, C., Yau, A., Ngan, P., Liang, Z., & Kuper, F. G. (2010). Validating foundry technologies for extended mission profiles. In 2010 IEEE International Reliability Physics Symposium, IRPS 2010: Anaheim, California, USA, 2 - 6 May 2010 (pp. 111-116). Piscataway, NJ: IEEE Computer Society. https://doi.org/10.1109/IRPS.2010.5488845