Validating foundry technologies for extended mission profiles

K. Dijk; P. Volf; C. Detcheverry; A. Yau; P. Ngan; Z. Liang; F.G. Kuper

doi:10.1109/IRPS.2010.5488845

Validating foundry technologies for extended mission profiles

K. Dijk, P. Volf, C. Detcheverry, A. Yau, P. Ngan, Z. Liang, F.G. Kuper

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

4 Citations (Scopus)

20 Downloads (Pure)

Abstract

This paper presents a process qualification and characterization strategy that can extend the foundry process reliability potential to meet specific automotive mission profile requirements. In this case study, data and analyses are provided that lead to sufficient confidence for pushing the allowed mission profile envelope of a process towards more aggressive (automotive) applications.

Original language	English
Title of host publication	2010 IEEE International Reliability Physics Symposium, IRPS 2010
Subtitle of host publication	Anaheim, California, USA, 2 - 6 May 2010
Place of Publication	Piscataway, NJ
Publisher	IEEE Computer Society
Pages	111-116
Number of pages	6
ISBN (Print)	978-1-4244-5430-3, 978-1-4244-5431-0
DOIs	https://doi.org/10.1109/IRPS.2010.5488845
Publication status	Published - 2 May 2010
Event	48th Annual IEEE International Reliability Physics Symposium, IRPS 2010 - Hyatt Regency Orange County Garden Grove, Anaheim, United States Duration: 2 May 2010 → 6 May 2010 Conference number: 48

Conference

Conference	48th Annual IEEE International Reliability Physics Symposium, IRPS 2010
Abbreviated title	IRPS
Country	United States
City	Anaheim
Period	2/05/10 → 6/05/10

Keywords

METIS-270932
IR-72455
SRAM Vddmin
HTOL
qualification strategy
guard band
test screens
EWI-18190
ppm level

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10.1109/IRPS.2010.5488845

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title = "Validating foundry technologies for extended mission profiles",

abstract = "This paper presents a process qualification and characterization strategy that can extend the foundry process reliability potential to meet specific automotive mission profile requirements. In this case study, data and analyses are provided that lead to sufficient confidence for pushing the allowed mission profile envelope of a process towards more aggressive (automotive) applications.",

keywords = "METIS-270932, IR-72455, SRAM Vddmin, HTOL, qualification strategy, guard band, test screens, EWI-18190, ppm level",

author = "K. Dijk and P. Volf and C. Detcheverry and A. Yau and P. Ngan and Z. Liang and F.G. Kuper",

note = "10.1109/IRPS.2010.5488845 ; 48th Annual IEEE International Reliability Physics Symposium, IRPS 2010, IRPS ; Conference date: 02-05-2010 Through 06-05-2010",

year = "2010",

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doi = "10.1109/IRPS.2010.5488845",

language = "English",

isbn = "978-1-4244-5430-3",

pages = "111--116",

booktitle = "2010 IEEE International Reliability Physics Symposium, IRPS 2010",

publisher = "IEEE Computer Society",

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Dijk, K, Volf, P, Detcheverry, C, Yau, A, Ngan, P, Liang, Z & Kuper, FG 2010, Validating foundry technologies for extended mission profiles. in 2010 IEEE International Reliability Physics Symposium, IRPS 2010: Anaheim, California, USA, 2 - 6 May 2010. IEEE Computer Society, Piscataway, NJ, pp. 111-116, 48th Annual IEEE International Reliability Physics Symposium, IRPS 2010, Anaheim, United States, 2/05/10. https://doi.org/10.1109/IRPS.2010.5488845

Validating foundry technologies for extended mission profiles. / Dijk, K.; Volf, P.; Detcheverry, C.; Yau, A.; Ngan, P.; Liang, Z.; Kuper, F.G.

2010 IEEE International Reliability Physics Symposium, IRPS 2010: Anaheim, California, USA, 2 - 6 May 2010. Piscataway, NJ : IEEE Computer Society, 2010. p. 111-116.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Volf, P.

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AU - Yau, A.

AU - Ngan, P.

AU - Liang, Z.

AU - Kuper, F.G.

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KW - METIS-270932

KW - IR-72455

KW - SRAM Vddmin

KW - HTOL

KW - qualification strategy

KW - guard band

KW - test screens

KW - EWI-18190

KW - ppm level

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