Variable reflectivity unstable resonators for a long pulse XeCl excimer laser

R.M. Hofstra; M.J. Zwegers; M.J. Zwegers; F.A. van Goor; W.J. Witteman

doi:10.1016/S0030-4018(98)00111-4

Variable reflectivity unstable resonators for a long pulse XeCl excimer laser

R.M. Hofstra, M.J. Zwegers, M.J. Zwegers, F.A. van Goor, W.J. Witteman

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

The divergence of a long pulse, low gain XeCl excimer laser has been improved using confocal positive branch unstable resonators with variable reflectivity mirrors as outcouplers. With variable reflectivity unstable resonators, nearly diffraction limited beams are obtained. Variable reflectivity resonators lead to high brightness beams (9.1 10 W/(cm sr)). Different reflection profiles were studied with respect to their influence on the beam quality and the energy extraction.

Original language	Undefined
Pages (from-to)	163-169
Number of pages	7
Journal	Optics communications
Volume	150
Issue number	(1-6)
DOIs	https://doi.org/10.1016/S0030-4018(98)00111-4
Publication status	Published - 1998

Keywords

Electromagnetic wave diffraction
Laser beams
Laser pulses
Optical resonators
IR-73649
Excimer lasers
Mirrors
Light reflection
METIS-128468
Confocal positive branch unstable resonators

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10.1016/S0030-4018(98)00111-4

Cite this

@article{1fb3d4cd76fa4340a7f8c635efae423b,

title = "Variable reflectivity unstable resonators for a long pulse XeCl excimer laser",

abstract = "The divergence of a long pulse, low gain XeCl excimer laser has been improved using confocal positive branch unstable resonators with variable reflectivity mirrors as outcouplers. With variable reflectivity unstable resonators, nearly diffraction limited beams are obtained. Variable reflectivity resonators lead to high brightness beams (9.1 10 W/(cm sr)). Different reflection profiles were studied with respect to their influence on the beam quality and the energy extraction.",

keywords = "Electromagnetic wave diffraction, Laser beams, Laser pulses, Optical resonators, IR-73649, Excimer lasers, Mirrors, Light reflection, METIS-128468, Confocal positive branch unstable resonators",

author = "R.M. Hofstra and M.J. Zwegers and M.J. Zwegers and {van Goor}, F.A. and W.J. Witteman",

year = "1998",

doi = "10.1016/S0030-4018(98)00111-4",

language = "Undefined",

volume = "150",

pages = "163--169",

journal = "Optics communications",

issn = "0030-4018",

publisher = "Elsevier B.V.",

number = "(1-6)",

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TY - JOUR

T1 - Variable reflectivity unstable resonators for a long pulse XeCl excimer laser

AU - Hofstra, R.M.

AU - Zwegers, M.J.

AU - van Goor, F.A.

AU - Witteman, W.J.

PY - 1998

Y1 - 1998

N2 - The divergence of a long pulse, low gain XeCl excimer laser has been improved using confocal positive branch unstable resonators with variable reflectivity mirrors as outcouplers. With variable reflectivity unstable resonators, nearly diffraction limited beams are obtained. Variable reflectivity resonators lead to high brightness beams (9.1 10 W/(cm sr)). Different reflection profiles were studied with respect to their influence on the beam quality and the energy extraction.

AB - The divergence of a long pulse, low gain XeCl excimer laser has been improved using confocal positive branch unstable resonators with variable reflectivity mirrors as outcouplers. With variable reflectivity unstable resonators, nearly diffraction limited beams are obtained. Variable reflectivity resonators lead to high brightness beams (9.1 10 W/(cm sr)). Different reflection profiles were studied with respect to their influence on the beam quality and the energy extraction.

KW - Electromagnetic wave diffraction

KW - Laser beams

KW - Laser pulses

KW - Optical resonators

KW - IR-73649

KW - Excimer lasers

KW - Mirrors

KW - Light reflection

KW - METIS-128468

KW - Confocal positive branch unstable resonators

U2 - 10.1016/S0030-4018(98)00111-4

DO - 10.1016/S0030-4018(98)00111-4

M3 - Article

SN - 0030-4018

VL - 150

SP - 163

EP - 169

JO - Optics communications

JF - Optics communications

IS - (1-6)

ER -