Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates

A.J. Nijdam, Johan W. Berenschot, J. van Suchtelen, Johannes G.E. Gardeniers, Michael Curt Elwenspoek

    Research output: Other contributionOther research output

    Original languageUndefined
    Place of PublicationEnschede
    Publication statusPublished - 23 Jun 1998

    Keywords

    • METIS-114668

    Cite this

    @misc{ad67b9f6a9744f12b6e5295e02777e7e,
    title = "Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates",
    keywords = "METIS-114668",
    author = "A.J. Nijdam and Berenschot, {Johan W.} and {van Suchtelen}, J. and Gardeniers, {Johannes G.E.} and Elwenspoek, {Michael Curt}",
    year = "1998",
    month = "6",
    day = "23",
    language = "Undefined",
    type = "Other",

    }

    Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates. / Nijdam, A.J.; Berenschot, Johan W.; van Suchtelen, J.; Gardeniers, Johannes G.E.; Elwenspoek, Michael Curt.

    Enschede. 1998, .

    Research output: Other contributionOther research output

    TY - GEN

    T1 - Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates

    AU - Nijdam, A.J.

    AU - Berenschot, Johan W.

    AU - van Suchtelen, J.

    AU - Gardeniers, Johannes G.E.

    AU - Elwenspoek, Michael Curt

    PY - 1998/6/23

    Y1 - 1998/6/23

    KW - METIS-114668

    M3 - Other contribution

    CY - Enschede

    ER -