Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry

Andrea Scarpa; Guoqiao Tao; Fred G. Kuper

doi:10.1109/RELPHY.2003.1197826

Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry

Andrea Scarpa, Guoqiao Tao, Fred G. Kuper

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	2003 IEEE International Reliability Physics Symposium proceedings
Subtitle of host publication	41st annual : Dallas, Texas, March 30-April 4, 2003
Place of Publication	Piscataway, NJ
Publisher	IEEE
Pages	602-603
Number of pages	2
ISBN (Print)	0-7803-7649-8
DOIs	https://doi.org/10.1109/RELPHY.2003.1197826
Publication status	Published - 30 Mar 2003
Event	41st Annual IEEE International Reliability Physics Symposium, IRPS 2003 - Dallas, United States Duration: 30 Mar 2003 → 4 Apr 2003

Conference

Conference	41st Annual IEEE International Reliability Physics Symposium, IRPS 2003
Abbreviated title	IRPS
Country/Territory	United States
City	Dallas
Period	30/03/03 → 4/04/03

Keywords

METIS-215884

Access to Document

10.1109/RELPHY.2003.1197826

Cite this

@inproceedings{e47d468b0e63435d8d87e03a2e80dbe9,

title = "Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry",

keywords = "METIS-215884",

author = "Andrea Scarpa and Guoqiao Tao and Kuper, {Fred G.}",

year = "2003",

month = mar,

day = "30",

doi = "10.1109/RELPHY.2003.1197826",

language = "English",

isbn = "0-7803-7649-8",

pages = "602--603",

booktitle = "2003 IEEE International Reliability Physics Symposium proceedings",

publisher = "IEEE",

note = "41st Annual IEEE International Reliability Physics Symposium, IRPS 2003, IRPS ; Conference date: 30-03-2003 Through 04-04-2003",

}

Scarpa, A, Tao, G & Kuper, FG 2003, Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry. in 2003 IEEE International Reliability Physics Symposium proceedings: 41st annual : Dallas, Texas, March 30-April 4, 2003. IEEE, Piscataway, NJ, pp. 602-603, 41st Annual IEEE International Reliability Physics Symposium, IRPS 2003, Dallas, Texas, United States, 30/03/03. https://doi.org/10.1109/RELPHY.2003.1197826

Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry. / Scarpa, Andrea; Tao, Guoqiao; Kuper, Fred G.

2003 IEEE International Reliability Physics Symposium proceedings: 41st annual : Dallas, Texas, March 30-April 4, 2003. Piscataway, NJ : IEEE, 2003. p. 602-603.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Wafer Level Reliability Monitoring Strategy of an Advanced Multi-Process Foundry

AU - Scarpa, Andrea

AU - Tao, Guoqiao

AU - Kuper, Fred G.

PY - 2003/3/30

Y1 - 2003/3/30

KW - METIS-215884

U2 - 10.1109/RELPHY.2003.1197826

DO - 10.1109/RELPHY.2003.1197826

M3 - Conference contribution

SN - 0-7803-7649-8

SP - 602

EP - 603

BT - 2003 IEEE International Reliability Physics Symposium proceedings

PB - IEEE

CY - Piscataway, NJ

T2 - 41st Annual IEEE International Reliability Physics Symposium, IRPS 2003

Y2 - 30 March 2003 through 4 April 2003

ER -