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Wafer-scale fabrication of high-density nanoslit arrays for surface-enhanced Raman spectroscopy

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    Abstract

    Surfaces with a periodic nanostructure and controllable feature size are sought after for optical applications, and the fabrication of such surfaces in large areas with high reproducibility, good stability and low deviation is very important. We present a strategy to fabricate large-area nanoslit arrays with controllable pitches and gaps. Au nanoslit arrays with gaps down to around 10 nm and a high gap density of 2.0 ×104 cm-1 have been fabricated, which can greatly enhance the near-field electromagnetic field to achieve localized surface plasmon resonance (LSPR). An averaged surface-enhanced Raman scattering analytical enhancement factor of 8.0 ×107 has been achieved on the substrate using a 633 nm laser source and the 'coupling effect' of LSPR of the nanoslits.

    Original languageEnglish
    Article number49LT01
    JournalNanotechnology
    Volume27
    DOIs
    Publication statusPublished - 10 Nov 2016

    Keywords

    • 2021 OA procedure
    • Nanogaps
    • Nanoslits
    • Surface enhanced Raman scattering
    • Wafer-scale fabrication
    • Localized surface plasmon resonance

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