Wafer-scale fabrication of high-quality sub-10 nm gold nanogaps

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Abstract

We report a robust and high-yield fabrication method for wafer-scale patterning of high-quality sub-10 nm gold displacement Talbot lithography (DTL) based shrink-etching technique [1] with dry etching, wet etching, and thin film deposition techniques. The fabricated Au nanogaps showed a significant enhancement of SERS signals of benzenethiol (BT) molecules chemisorbed on the structure surface.
Original languageEnglish
Title of host publicationMicroTAS 2018
Subtitle of host publicationThe 22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences
EditorsFan-Gang Tseng, Gwo-Bin Lee
PublisherThe Chemical and Biological Microsystems Society
Pages574-577
Number of pages3
ISBN (Electronic)978-0-578-40530-8
Publication statusPublished - 11 Nov 2018
Event22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2018 - Kaohsiung Exhibition Center, Kaohsiung, Taiwan, Province of China
Duration: 10 Nov 201815 Nov 2018
Conference number: 22
https://cbmsociety.org/conferences/microtas2018/

Conference

Conference22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2018
Abbreviated titleMicroTAS 2018
CountryTaiwan, Province of China
CityKaohsiung
Period10/11/1815/11/18
Internet address

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Keywords

  • PhableR 100C
  • Displacement Talbot lithography
  • Plasmonic substrates
  • Gold nanogaps

Cite this

Le The, H., Lozeman, J. J. A., Bomer, J. G., Tong, H. D., Berenschot, E., van den Berg, A., ... Eijkel, J. C. T. (2018). Wafer-scale fabrication of high-quality sub-10 nm gold nanogaps. In F-G. Tseng, & G-B. Lee (Eds.), MicroTAS 2018: The 22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences (pp. 574-577). The Chemical and Biological Microsystems Society.