Abstract
We report a robust and high-yield fabrication method for wafer-scale patterning of high-quality sub-10 nm gold displacement Talbot lithography (DTL) based shrink-etching technique [1] with dry etching, wet etching, and thin film deposition techniques. The fabricated Au nanogaps showed a significant enhancement of SERS signals of benzenethiol (BT) molecules chemisorbed on the structure surface.
Original language | English |
---|---|
Title of host publication | MicroTAS 2018 |
Subtitle of host publication | The 22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences |
Editors | Fan-Gang Tseng, Gwo-Bin Lee |
Publisher | The Chemical and Biological Microsystems Society |
Pages | 574-577 |
Number of pages | 3 |
ISBN (Electronic) | 978-0-578-40530-8 |
Publication status | Published - 11 Nov 2018 |
Event | 22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2018 - Kaohsiung Exhibition Center, Kaohsiung, Taiwan Duration: 10 Nov 2018 → 15 Nov 2018 Conference number: 22 https://cbmsociety.org/conferences/microtas2018/ |
Conference
Conference | 22nd International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2018 |
---|---|
Abbreviated title | MicroTAS 2018 |
Country/Territory | Taiwan |
City | Kaohsiung |
Period | 10/11/18 → 15/11/18 |
Internet address |
Keywords
- PhableR 100C
- Displacement Talbot lithography
- Plasmonic substrates
- Gold nanogaps