Wafer-scale fabrication of high-quality tunable gold nanogap arrays for surface-enhanced Raman scattering

Hai Le-The*, Jasper J.A. Lozeman, Marta Lafuente, Pablo Muñoz, Johan G. Bomer, Hien Duy-Tong, Erwin Berenschot, Albert Van Den Berg, Niels R. Tas, Mathieu Odijk, Jan C.T. Eijkel

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

11 Citations (Scopus)
43 Downloads (Pure)


We report a robust and high-yield fabrication method for wafer-scale patterning of high-quality arrays of dense gold nanogaps, combining displacement Talbot lithography based shrink-etching with dry etching, wet etching, and thin film deposition techniques. By using the self-sharpening of <111>-oriented silicon crystal planes during the wet etching process, silicon structures with extremely smooth nanogaps are obtained. Subsequent conformal deposition of a silicon nitride layer and a gold layer results in dense arrays of narrow gold nanogaps. Using this method, we successfully fabricate high-quality Au nanogaps down to 10 nm over full wafer areas. Moreover, the gap spacing can be tuned by changing the thickness of deposited Au layers. Since the roughness of the template is minimized by the crystallographic etching of silicon, the roughness of the gold nanogaps depends almost exclusively on the roughness of the sputtered gold layers. Additionally, our fabricated Au nanogaps show a significant enhancement of surface-enhanced Raman scattering (SERS) signals of benzenethiol molecules chemisorbed on the structure surface, at an average enhancement factor up to 1.5 × 106.

Original languageEnglish
Pages (from-to)12152-12160
Number of pages9
Issue number25
Early online date10 Jun 2019
Publication statusPublished - 7 Jul 2019


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