Abstract
We propose a wafer-scale technique for nanostructure formation inside vertically oriented, through-membrane nano-pores. It uses 50 nm monocrystalline silicon pillars as a mold, embedded in a silicon nitride membrane formed in an innovative step. The proposed technique paves the way towards advanced functionalization of parallel oriented nano-pores for actuation, sensing, filtering/trapping purposes.
Original language | English |
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Title of host publication | IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS 2017) |
Place of Publication | Piscataway, NJ |
Publisher | IEEE |
Number of pages | 4 |
ISBN (Electronic) | 978-1-5090-3059-0 |
ISBN (Print) | 978-1-5090-3060-6 |
Publication status | Published - Apr 2017 |
Event | 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017 - UCLA Meyer & Renee Luskin Conference Center, Los Angeles, United States Duration: 9 Apr 2017 → 12 Apr 2017 Conference number: 12 |
Publication series
Name | IEEE International Conference on Nano/Micro Engineered and Molecular Systems |
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Publisher | IEEE |
ISSN (Print) | 2474-3755 |
Conference
Conference | 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017 |
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Abbreviated title | NEMS |
Country/Territory | United States |
City | Los Angeles |
Period | 9/04/17 → 12/04/17 |
Keywords
- Nano-pores
- membrane
- corner lithography
- anisotropic etching
- conformal deposition