Abstract
We propose a wafer-scale technique for nanostructure formation inside vertically oriented, through-membrane nano-pores. It uses 50 nm monocrystalline silicon pillars as a mold, embedded in a silicon nitride membrane formed in an innovative step. The proposed technique paves the way towards advanced functionalization of parallel oriented nano-pores for actuation, sensing, filtering/trapping purposes.
| Original language | English |
|---|---|
| Title of host publication | IEEE 12th International Conference on Nano/Micro Engineered and Molecular Systems (NEMS 2017) |
| Place of Publication | Piscataway, NJ |
| Publisher | IEEE |
| Number of pages | 4 |
| ISBN (Electronic) | 978-1-5090-3059-0 |
| ISBN (Print) | 978-1-5090-3060-6 |
| Publication status | Published - Apr 2017 |
| Event | 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017 - UCLA Meyer & Renee Luskin Conference Center, Los Angeles, United States Duration: 9 Apr 2017 → 12 Apr 2017 Conference number: 12 |
Publication series
| Name | IEEE International Conference on Nano/Micro Engineered and Molecular Systems |
|---|---|
| Publisher | IEEE |
| ISSN (Print) | 2474-3755 |
Conference
| Conference | 12th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2017 |
|---|---|
| Abbreviated title | NEMS |
| Country/Territory | United States |
| City | Los Angeles |
| Period | 9/04/17 → 12/04/17 |
Keywords
- Nano-pores
- membrane
- corner lithography
- anisotropic etching
- conformal deposition
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