TY - JOUR
T1 - Water adsorption on vanadium oxide thin films in ambient relative humidity
AU - Goodacre, Dana
AU - Blum, Monika
AU - Buechner, Christin
AU - Hoek, Harmen
AU - Gericke, Sabrina M.
AU - Jovic, Vedran
AU - Franklin, Joseph B.
AU - Kittiwatanakul, Salinporn
AU - Söhnel, Tilo
AU - Bluhm, Hendrik
AU - Smith, Kevin E.
N1 - Funding Information:
This research used resources of the Advanced Light Source, which is a DOE Office of Science User Facility under Contract No. DE-AC02-05CH11231. D.G. is grateful for an ALS Doctoral Fellowship in Residence. H.B., C.B., H.H., and S.G. acknowledge support from the Division of Chemical Sciences, Geosciences and Biosciences of the U.S. Department of Energy at LBNL under Contract No. DE-AC02-05CH11231. C.B. is grateful for support from the Alexander von Humboldt Foundation through a Feodor Lynen Research Fellowship. S.G. is grateful for support from a PROMOS scholarship provided by the Freie Universität Berlin. J.B.F. acknowledges support from the European Union Horizon 2020 under the Marie Sklodowska-Curie Grant Agreement No. 705339 and is grateful for support from the Science and Technology Facilities Council Early Career Award No. ST/K00171X/1. The Boston University program was supported by the Department of Energy under Grant No. DE-FG02-98ER45680.
Publisher Copyright:
© 2020 Author(s).
PY - 2020/1/31
Y1 - 2020/1/31
N2 - In this work, ambient pressure X-ray photoelectron spectroscopy (APXPS) is used to study the initial stages of water adsorption on vanadium oxide surfaces. V 2p, O 1s, C 1s, and valence band XPS spectra were collected as a function of relative humidity in a series of isotherm and isobar experiments. Experiments were carried out on two VO2 thin films on TiO2 (100) substrates, prepared with different surface cleaning procedures. Hydroxyl and molecular water surface species were identified, with up to 0.5 ML hydroxide present at the minimum relative humidity, and a consistent molecular water adsorption onset occurring around 0.01% relative humidity. The work function was found to increase with increasing relative humidity, suggesting that surface water and hydroxyl species are oriented with the hydrogen atoms directed away from the surface. Changes in the valence band were also observed as a function of relative humidity. The results were similar to those observed in APXPS experiments on other transition metal oxide surfaces, suggesting that H2O-OH and H2O-H2O surface complex formation plays an important role in the oxide wetting process and water dissociation. Compared to polycrystalline vanadium metal, these vanadium oxide films generate less hydroxide and appear to be more favorable for molecular water adsorption.
AB - In this work, ambient pressure X-ray photoelectron spectroscopy (APXPS) is used to study the initial stages of water adsorption on vanadium oxide surfaces. V 2p, O 1s, C 1s, and valence band XPS spectra were collected as a function of relative humidity in a series of isotherm and isobar experiments. Experiments were carried out on two VO2 thin films on TiO2 (100) substrates, prepared with different surface cleaning procedures. Hydroxyl and molecular water surface species were identified, with up to 0.5 ML hydroxide present at the minimum relative humidity, and a consistent molecular water adsorption onset occurring around 0.01% relative humidity. The work function was found to increase with increasing relative humidity, suggesting that surface water and hydroxyl species are oriented with the hydrogen atoms directed away from the surface. Changes in the valence band were also observed as a function of relative humidity. The results were similar to those observed in APXPS experiments on other transition metal oxide surfaces, suggesting that H2O-OH and H2O-H2O surface complex formation plays an important role in the oxide wetting process and water dissociation. Compared to polycrystalline vanadium metal, these vanadium oxide films generate less hydroxide and appear to be more favorable for molecular water adsorption.
UR - http://www.scopus.com/inward/record.url?scp=85078831362&partnerID=8YFLogxK
U2 - 10.1063/1.5138959
DO - 10.1063/1.5138959
M3 - Article
C2 - 32007066
AN - SCOPUS:85078831362
SN - 0021-9606
VL - 152
JO - The Journal of chemical physics
JF - The Journal of chemical physics
IS - 4
M1 - 044715
ER -