Wavelength selection for multilayer coatings for the lithography generation beyond extreme ultraviolet

Igor Alexandrovich Makhotkin, E. Zoethout, Eric Louis, A.M. Yakunin, S. Muellender, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

13 Citations (Scopus)
59 Downloads (Pure)

Abstract

Reducing the operating wavelength in advanced photolitho- graphy while maintaining the lithography machine’s produc- tivity has been a traditional way to enable improved imaging for the last 20 years. The transition from 13.5 nm to 6.5 to 6.9 nm optical lithography offers a possibility to combine high imaging capabilities using a manageable process win- dow. It is shown that around 6.6 nm wavelength, the high- est reflectance is obtained with multilayer mirrors based on lanthanum as a reflector and boron as a spacer material. Boron is the preferred spacer material for this wavelength because of the close proximity to the boron K-absorption edge.
Original languageEnglish
Article number040501
Pages (from-to)040501-1-040501-3
Number of pages3
JournalJournal of micro/nanolithography, MEMS, and MOEMS
Volume11
Issue number4
DOIs
Publication statusPublished - 19 Oct 2012

Keywords

  • IR-83095
  • METIS-292756

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