Abstract
The spectral properties of LaN/B and LaN/B4C multilayer mirrors have been investigated in the 6.5-6.9 nm wavelength range, based on measured B and B4C optical constants. We show that the wavelength of optimal single mirror reflectance for boron based optics is between 6.63 and 6.65 nm, depending on the boron chemical state. The wavelength of the maximum reflectance of the LaN/B4C multilayer system is confirmed experimentally. Calculations of the wavelengthintegrated reflectance for ideal 10-multilayer-mirror stacks show that a B-based optical column can be optimized for a wavelength larger than 6.65 nm.
Original language | English |
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Title of host publication | Extreme Ultraviolet (EUV) Lithography III |
Editors | Patrick P. Naulleau, Obert R. Wood II |
Place of Publication | Bellingham, WA |
Publisher | SPIE |
Number of pages | 5 |
ISBN (Print) | 9780819489784 |
DOIs | |
Publication status | Published - 13 Mar 2012 |
Event | SPIE Conference on Extreme Ultraviolet (EUV) Lithography III, 2012 - San Jose Convention Center and San Jose Marriott, San Jose, United States Duration: 12 Feb 2012 → 16 Feb 2012 Conference number: 3 |
Publication series
Name | Proceedings of SPIE |
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Publisher | SPIE |
Volume | 8322 |
ISSN (Print) | 0277-786X |
Conference
Conference | SPIE Conference on Extreme Ultraviolet (EUV) Lithography III, 2012 |
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Country/Territory | United States |
City | San Jose |
Period | 12/02/12 → 16/02/12 |
Keywords
- PhysicsIndustriele produktie en technologie
- IR-81732