Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Toine van den Boogaard; F.A. van Goor; Eric Louis; Frederik Bijkerk

doi:10.1364/OL.37.000160

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Toine van den Boogaard, F.A. van Goor, Eric Louis, Frederik Bijkerk

Research output: Contribution to journal › Article › Academic › peer-review

17 Citations (Scopus)

Abstract

A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.

Original language	English
Pages (from-to)	160-162
Number of pages	2
Journal	Optics letters
Volume	37
Issue number	2
DOIs	https://doi.org/10.1364/OL.37.000160
Publication status	Published - 10 Jan 2012

Keywords

IR-82231
METIS-288918

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10.1364/OL.37.000160

Cite this

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title = "Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection",

abstract = "A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.",

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T1 - Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

AU - van den Boogaard, Toine

AU - van Goor, F.A.

AU - Louis, Eric

AU - Bijkerk, Frederik

PY - 2012/1/10

Y1 - 2012/1/10

N2 - A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.

AB - A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.

KW - IR-82231

KW - METIS-288918

U2 - 10.1364/OL.37.000160

DO - 10.1364/OL.37.000160

M3 - Article

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SP - 160

EP - 162

JO - Optics letters

JF - Optics letters

SN - 0146-9592

IS - 2

ER -

Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Abstract

Keywords

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