Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection

Toine van den Boogaard, F.A. van Goor, Eric Louis, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

17 Citations (Scopus)


A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5  nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100  nm out-of-band radiation in EUV lithography.
Original languageEnglish
Pages (from-to)160-162
Number of pages2
JournalOptics letters
Issue number2
Publication statusPublished - 10 Jan 2012


  • IR-82231
  • METIS-288918


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