Abstract
A generic design and fabrication scheme of Mo/Si multilayer-grating phaseshift reflector systems is reported. Close to optimized extreme ultraviolet (EUV, λ=13.5 nm ) reflectance values up to 64% are demonstrated, while the diffractive properties can be exploited in spectral filtering applications. The results can contribute to a wavelength-unspecific solution for the suppression of λ>100 nm out-of-band radiation in EUV lithography.
Original language | English |
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Pages (from-to) | 160-162 |
Number of pages | 2 |
Journal | Optics letters |
Volume | 37 |
Issue number | 2 |
DOIs | |
Publication status | Published - 10 Jan 2012 |
Keywords
- IR-82231
- METIS-288918