Abstract
Wideband multilayers designed for various applications in hard
X-ray to Extreme UV spectral regions are based on a layered system with
layer thicknesses varying largely in depth. However, because the internal
structure of a thin film depends on its thickness, this will result in
multilayers in which material properties such as density, crystallinity,
dielectric constant and effective thickness vary from layer to layer. This
variation causes the fabricated multilayers to deviate from the model and
negatively influences the reflectivity of the multilayers. In this work we
solve this problem by developing designs of wideband multilayers with
strongly reduced layer thickness variations in depth, without essential
degradation of their optical characteristics.
Original language | English |
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Pages (from-to) | 9276-9283 |
Number of pages | 8 |
Journal | Optics express |
Volume | 23 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2015 |