Wideband multilayer mirrors with minimal layer thicknesses variation

I.V. Kozhevnikov, Andrey Yakshin, Fred Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

12 Citations (Scopus)
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Abstract

Wideband multilayers designed for various applications in hard X-ray to Extreme UV spectral regions are based on a layered system with layer thicknesses varying largely in depth. However, because the internal structure of a thin film depends on its thickness, this will result in multilayers in which material properties such as density, crystallinity, dielectric constant and effective thickness vary from layer to layer. This variation causes the fabricated multilayers to deviate from the model and negatively influences the reflectivity of the multilayers. In this work we solve this problem by developing designs of wideband multilayers with strongly reduced layer thickness variations in depth, without essential degradation of their optical characteristics.
Original languageEnglish
Pages (from-to)9276-9283
Number of pages8
JournalOptics express
Volume23
Issue number7
DOIs
Publication statusPublished - 2015

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mirrors
broadband
crystallinity
rays
permittivity
reflectance
causes
thin films

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Wideband multilayer mirrors with minimal layer thicknesses variation. / Kozhevnikov, I.V.; Yakshin, Andrey; Bijkerk, Fred.

In: Optics express, Vol. 23, No. 7, 2015, p. 9276-9283.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Wideband multilayer mirrors with minimal layer thicknesses variation

AU - Kozhevnikov, I.V.

AU - Yakshin, Andrey

AU - Bijkerk, Fred

PY - 2015

Y1 - 2015

N2 - Wideband multilayers designed for various applications in hard X-ray to Extreme UV spectral regions are based on a layered system with layer thicknesses varying largely in depth. However, because the internal structure of a thin film depends on its thickness, this will result in multilayers in which material properties such as density, crystallinity, dielectric constant and effective thickness vary from layer to layer. This variation causes the fabricated multilayers to deviate from the model and negatively influences the reflectivity of the multilayers. In this work we solve this problem by developing designs of wideband multilayers with strongly reduced layer thickness variations in depth, without essential degradation of their optical characteristics.

AB - Wideband multilayers designed for various applications in hard X-ray to Extreme UV spectral regions are based on a layered system with layer thicknesses varying largely in depth. However, because the internal structure of a thin film depends on its thickness, this will result in multilayers in which material properties such as density, crystallinity, dielectric constant and effective thickness vary from layer to layer. This variation causes the fabricated multilayers to deviate from the model and negatively influences the reflectivity of the multilayers. In this work we solve this problem by developing designs of wideband multilayers with strongly reduced layer thickness variations in depth, without essential degradation of their optical characteristics.

U2 - 10.1364/OE.23.009276

DO - 10.1364/OE.23.009276

M3 - Article

VL - 23

SP - 9276

EP - 9283

JO - Optics express

JF - Optics express

SN - 1094-4087

IS - 7

ER -