Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM

Jing Song; Mark A. Hempenius; Hong Jing Chung; G. Julius Vancso

doi:10.1039/c5nr01206f

Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM

Jing Song, Mark A. Hempenius, Hong Jing Chung, G. Julius Vancso^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.

Original language	English
Pages (from-to)	9970-9974
Number of pages	5
Journal	Nanoscale
Volume	7
Issue number	22
DOIs	https://doi.org/10.1039/c5nr01206f
Publication status	Published - 14 Jun 2015

Keywords

2023 OA procedure

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10.1039/c5nr01206f

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title = "Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM",

abstract = "Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.",

keywords = "2023 OA procedure",

author = "Jing Song and Hempenius, {Mark A.} and Chung, {Hong Jing} and {Julius Vancso}, G.",

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AU - Song, Jing

AU - Hempenius, Mark A.

AU - Chung, Hong Jing

AU - Julius Vancso, G.

PY - 2015/6/14

Y1 - 2015/6/14

N2 - Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.

AB - Nanoelectrochemical patterning of redox responsive organometallic poly(ferrocenylsilane) (PFS) multilayers is demonstrated by electrochemical dip pen lithography (EDPN). Local electrochemical oxidation and Joule heating of PFS multilayers from the tip are considered as relevant mechanisms related to structure generation. The influence of applied bias potential, tip velocity, and multilayer thickness on the pattern height and width were investigated.

KW - 2023 OA procedure

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U2 - 10.1039/c5nr01206f

DO - 10.1039/c5nr01206f

M3 - Article

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EP - 9974

JO - Nanoscale

JF - Nanoscale

IS - 22

ER -

Writing nanopatterns with electrochemical oxidation on redox responsive organometallic multilayers by AFM

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