X-ray diffraction analysis of damage and doping effects in low-dose, high-energy implanted silicon

J.G.E. Klappe, I. Barsony, T.W. Ryan

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings Symposium Materials Research Society, Vol. 235
    Place of PublicationBoston
    Number of pages0
    Publication statusPublished - 2 Dec 1992


    • METIS-113999

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