X-ray diffraction analysis of damage and doping effects in low-dose, high-energy implanted silicon

J.G.E. Klappe, I. Barsony, T.W. Ryan

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	Undefined
Title of host publication	Proceedings Symposium Materials Research Society, Vol. 235
Place of Publication	Boston
Pages	185-190
Number of pages	0
Publication status	Published - 2 Dec 1992

Keywords

@inproceedings{b4b0d1e26657458180b11f17ddd94d34,

title = "X-ray diffraction analysis of damage and doping effects in low-dose, high-energy implanted silicon",

keywords = "METIS-113999",

author = "J.G.E. Klappe and I. Barsony and T.W. Ryan",

year = "1992",

month = dec,

day = "2",

language = "Undefined",

pages = "185--190",

booktitle = "Proceedings Symposium Materials Research Society, Vol. 235",

}